发明名称 METHOD FOR DETERMINING NUMBER OF LAYERS OF TWO-DIMENSIONAL THIN FILM ATOMIC STRUCTURE AND DEVICE FOR DETERMINING NUMBER OF LAYERS OF TWO-DIMENSIONAL THIN FILM ATOMIC STRUCTURE
摘要 Provided is a versatile method of determining the number of layers of a two-dimensional atomic layer thin film as compared with conventional methods. An electron beam is radiated to a two-dimensional thin film atomic structure having an unknown number of layers to determine the number of layers based on an intensity of reflected electrons or secondary electrons generated thereby. In particular, this method is effective for determining the number of layers of graphene.
申请公布号 US2013087705(A1) 申请公布日期 2013.04.11
申请号 US201113704670 申请日期 2011.06.22
申请人 HIURA HIDEFUMI;TSUKAGOSHI KAZUHITO;MIYAZAKI HISAO;NATIONAL INSTITUTE FOR MATERIALS SCIENCE;NEC CORPORATION 发明人 HIURA HIDEFUMI;TSUKAGOSHI KAZUHITO;MIYAZAKI HISAO
分类号 G01N23/225 主分类号 G01N23/225
代理机构 代理人
主权项
地址