发明名称 COBALT-FILM-FORMING METHOD, COBALT-FILM-FORMING MATERIAL, AND NOVEL COMPOUND
摘要 Provided is a technique making it easy to form a high-quality cobalt-based film which has a low melting point and is liquid at about 40°C, is unlikely to solidify and create a blockage midway in piping, and enables a stable supply of raw material, the technique involving the use of cobalt bis(N,N'-diisopropyl-propionamidinate).
申请公布号 WO2013051670(A1) 申请公布日期 2013.04.11
申请号 WO2012JP75855 申请日期 2012.10.04
申请人 GAS-PHASE GROWTH LTD.;TOKYO ELECTRON LIMITED;MACHIDA HIDEAKI;ISHIKAWA MASATO;SUDOH HIROSHI;KAWANO YUMIKO;IWAI KAZUTOSHI 发明人 MACHIDA HIDEAKI;ISHIKAWA MASATO;SUDOH HIROSHI;KAWANO YUMIKO;IWAI KAZUTOSHI
分类号 C23C16/18;C07C211/65;C07C257/14;C07F15/06 主分类号 C23C16/18
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