发明名称 |
COBALT-FILM-FORMING METHOD, COBALT-FILM-FORMING MATERIAL, AND NOVEL COMPOUND |
摘要 |
Provided is a technique making it easy to form a high-quality cobalt-based film which has a low melting point and is liquid at about 40°C, is unlikely to solidify and create a blockage midway in piping, and enables a stable supply of raw material, the technique involving the use of cobalt bis(N,N'-diisopropyl-propionamidinate). |
申请公布号 |
WO2013051670(A1) |
申请公布日期 |
2013.04.11 |
申请号 |
WO2012JP75855 |
申请日期 |
2012.10.04 |
申请人 |
GAS-PHASE GROWTH LTD.;TOKYO ELECTRON LIMITED;MACHIDA HIDEAKI;ISHIKAWA MASATO;SUDOH HIROSHI;KAWANO YUMIKO;IWAI KAZUTOSHI |
发明人 |
MACHIDA HIDEAKI;ISHIKAWA MASATO;SUDOH HIROSHI;KAWANO YUMIKO;IWAI KAZUTOSHI |
分类号 |
C23C16/18;C07C211/65;C07C257/14;C07F15/06 |
主分类号 |
C23C16/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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