| 发明名称 |
PLASMA-ENHANCED DEPOSITION OF TITANIUM-CONTAINING FILMS FOR VARIOUS APPLICATIONS USING AMIDINATE TITANIUM PRECURSORS |
| 摘要 |
The present invention relates to a process for the use of Titanium amidinate metal precursors for the deposition of Titanium-containing films via Plasma Enhanced Atomic Layer Deposition (PEALD) or Plasma Enhanced Chemical Vapor Deposition (PECVD).
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| 申请公布号 |
US2013089681(A1) |
申请公布日期 |
2013.04.11 |
| 申请号 |
US201113269163 |
申请日期 |
2011.10.07 |
| 申请人 |
DUSSARRAT CHRISTIAN;OMARJEE VINCENT M.;LANSALOT-MATRAS CLEMENT;AMERICAN AIR LIQUIDE, INC. |
发明人 |
DUSSARRAT CHRISTIAN;OMARJEE VINCENT M.;LANSALOT-MATRAS CLEMENT |
| 分类号 |
C23C16/18 |
主分类号 |
C23C16/18 |
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