| 摘要 |
PURPOSE: A vacuum control system and a vacuum control method are provided to control a gas flow in a vacuum container by controlling a direction of a processing gas. CONSTITUTION: A vacuum container(500) receives a processing gas from a gas supply unit to process an object. A vacuum control valve(100,200) is connected between a vacuum pump(300) and each gas outlet(561,562) arranged in the vacuum container. A pressure measuring unit(631) measures the vacuum pressure of the processing gas supplied to the object. A controller(610) controls the opening of each vacuum control valve according to the measured vacuum pressure. [Reference numerals] (610) Controller; (620) Correction value data storage unit; (AA) Gas(flow rate Q); (pv1) Reference valve opening command value; (Pv2) Valve position command value; (Pva) Offset valve opening command value; |
