FILM FORMATION APPARATUS, FILM FORMATION METHOD, AND STORAGE MEDIUM

摘要

A film formation apparatus (1) is provided with: a stage (11) for holding a template (T) comprising a transcription pattern forming section (T1) that has a transcription pattern formed thereon and an outer section (T2) that is provided so as to surround the transcription pattern forming section (T1); and a main body section (21) for forming a mold-release film by supplying film formation gas to the transcription pattern forming section (T1). The film formation apparatus (1) is also provided with: a purge gas supplying section (51) that supplies purge fluid to the outer section (T2); and an exhaust section (44) that is provided inside the purge gas supplying section (51), and that is for exhausting purge fluid flowing from the outer section (T2) towards the transcription pattern forming section (T1) and for exhausting surplus film formation gas flowing from the transcription pattern forming section (T1) towards the side faces of the template (T).