| 摘要 |
<P>PROBLEM TO BE SOLVED: To correct movement of a workpiece in a plane parallel to a work face, resulting from straightness of a Z-direction movement mechanism when the workpiece is moved in a direction (a Z direction) perpendicular to the work face. <P>SOLUTION: Exposure equipment detects a mask mark MAM image of a mask M by an alignment microscope 80 to store the position, then places a workpiece W on a suction table 33 and detects a position of a work mark WAM to align the workpiece W with the mask M, and measures a distance a from a slider 32 to a reflection mirror 35 by a laser length measuring machine 34 to store the distance a. For exposure processing, the equipment then lowers a work stage 30 by a distance equal to a thickness of the workpiece W by a Z-direction movement mechanism 50, and measures a distance b from the slider 32 to the reflection mirror 35 by the laser length measuring machine 34, and then detects a movement amount due to the lowering of the work stage 30 according to the distance a and the distance b to return a position of the workpiece W to a position at which the workpiece W is aligned with the mask M, and in this state emits exposure light from a light emitting unit 10 to expose the workpiece W. <P>COPYRIGHT: (C)2013,JPO&INPIT |
