发明名称 |
IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY INCLUDING SAME |
摘要 |
An imaging optical system has a plurality of mirrors which image an object field in an object plane into an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The imaging optical system has precisely eight mirrors. The result is an imaging optical system which exhibits a favorable combination of small imaging errors, manageable production and good throughput. |
申请公布号 |
US2013088701(A1) |
申请公布日期 |
2013.04.11 |
申请号 |
US201213692030 |
申请日期 |
2012.12.03 |
申请人 |
CARL ZEISS SMT GMBH;CARL ZEISS SMT GMBH |
发明人 |
MANN HANS-JUERGEN;EPPLE ALEXANDER |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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