| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for dynamically establishing a baseline in a plasma processing system. <P>SOLUTION: The method includes: processing a first substrate; collecting a first signal data for the first substrate; comparing the first signal data against the baseline; and adding the first signal data in recalculation of the baseline if the first signal data is within a reliability level range which is in between a top level above the baseline and a bottom level below the baseline. <P>COPYRIGHT: (C)2013,JPO&INPIT |
