| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique advantageous for processes using gray tone masks. <P>SOLUTION: An exposure device EX comprises a mask positioning mechanism 2 for positioning a mask M including a first gray tone pattern in a first direction and a second gray tone pattern in a second direction orthogonal thereto; a substrate positioning mechanism 4 for positioning a substrate S; a projection optical system 3 that forms images of the patterns on the substrate; and a controller 5 that determines, on the basis of first and second defocusing characteristics that represent the relationships between the thicknesses of first and second resist patterns formed by the first and second gray tone patterns through exposure and development and an extent of defocusing in the exposure, an extent of defocusing that can keep the difference between the thicknesses of the first and second gray tone patterns within a permissible range, and so controls the exposure processing of the substrate that an image of the patterns can be formed on the substrate with that determined extent of defocusing. <P>COPYRIGHT: (C)2013,JPO&INPIT |
