发明名称 PATTERNING CONTACTS IN CARBON NANOTUBE DEVICES
摘要 A structure includes a substrate having a carbon nanotube (CNT) disposed over a surface. The CNT is partially disposed within a protective electrically insulating layer. The structure further includes a gate stack disposed over the substrate. A first portion of a length of the CNT not covered by the protective electrically insulating layer passes through the gate stack. Source and drain contacts are disposed adjacent to the gate stack, where second and third portions of the length of CNT not covered by the protective electrically insulating layer are conductively electrically coupled to the source and drain contacts. The gate stack and the source and drain contacts are contained within the protective electrically insulating layer and within an electrically insulating organic planarization layer that is disposed over the protective electrically insulating layer. A method to fabricate a CNT-based transistor is also described.
申请公布号 US2013087767(A1) 申请公布日期 2013.04.11
申请号 US201113270648 申请日期 2011.10.11
申请人 CHANG JOSEPHINE B.;GLODDE MARTIN;GUILLORN MICHAEL A.;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHANG JOSEPHINE B.;GLODDE MARTIN;GUILLORN MICHAEL A.
分类号 H01L49/02;H01L49/00 主分类号 H01L49/02
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