发明名称 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
摘要 |
A particle-optical arrangement, comprises at least one charged-particle source 319 for generating at least one beam of charged particles, at least one multi-aperture plate 313 having a plurality of apertures formed in the plate, wherein the plurality of apertures is arranged in a first pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the aperture plate; and a first focusing lens 303 providing a magnetic field having a focusing field portion in a region between the charged-particle source and the multi-aperture plate; wherein the at least one charged-particle source is arranged within the magnetic field provided by the first focusing lens. |
申请公布号 |
EP2579270(A2) |
申请公布日期 |
2013.04.10 |
申请号 |
EP20120190693 |
申请日期 |
2004.09.07 |
申请人 |
CARL ZEISS SMT GMBH;APPLIED MATERIALS ISRAEL |
发明人 |
KNIPPELMEYER, RAINER;KIENZLE, OLIVER;KEMEN, THOMAS;MUELLER, HEIKO;UHLEMANN, STEPHAN;HAIDER, MAXIMILIAN;CASARES, ANTONIO;ROGERS, STEVEN |
分类号 |
G21K5/10;G01N23/00;H01J;H01J37/09;H01J37/14;H01J37/153;H01J37/28;H01J37/317 |
主分类号 |
G21K5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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