发明名称 LASER EXPOSURE METHOD AND PRODUCT
摘要 Provided are a high-resolution laser exposure method and a product manufactured with use of the laser exposure method, the laser exposure method being capable of performing high-resolution laser plate-making in gravure plate-making, offset plate-making, flexo plate-making, and the like, and being usable in laser exposure of a circuit pattern in an electronic component such as a printed circuit board, a liquid crystal display, and a plasma display, or in special printing for prevention of forgery of banknotes and the like. The laser exposure method, which uses a laser exposure apparatus, includes: scanning laser beams to form a laser spot array having a predetermined length on a photosensitive film; and exposing the photosensitive film coated on a plate surface to light, to thereby form a photosensitized part and a non-photosensitized part. The scanning includes sequentially scanning, for exposure, a subsequent laser spot array so that at least a half region of a previously scanned laser spot array in a width direction thereof is subjected to superimposed exposure.
申请公布号 EP2579099(A1) 申请公布日期 2013.04.10
申请号 EP20110789644 申请日期 2011.05.23
申请人 THINK LABORATORY CO., LTD. 发明人 SHIGETA, TATSUO;HORIUCHI, HITOSHI
分类号 G03F7/20 主分类号 G03F7/20
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