发明名称 DECOMPOSITION/ELIMINATION METHOD USING A PHOTOCATALYTIC MATERIAL
摘要 <p>The present invention provides a new method for decomposing and/or removing hazardous substances using a photocatalytic material. The method of the present invention is sufficiently useful in fields requiring quick decomposition and/or removal of hazardous substances in gas and/or liquid phases. The decomposition method of the present invention using a photocatalytic material enables significantly efficient and rapid decomposition of hazardous substances in gas and/or liquid phases by causing a photocatalytic material to coexist with a dilute hydrogen peroxide solution.</p>
申请公布号 EP2578301(A1) 申请公布日期 2013.04.10
申请号 EP20110789741 申请日期 2011.05.30
申请人 SHOWA CO., LTD. 发明人 TAKAYASU, TERUKI;ARAI, TERUO;ONODA, KINJI
分类号 B01D53/86;B01D53/56;B01D53/78;B01J35/02;B01J37/12;B01J37/34 主分类号 B01D53/86
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