发明名称 |
DECOMPOSITION/ELIMINATION METHOD USING A PHOTOCATALYTIC MATERIAL |
摘要 |
<p>The present invention provides a new method for decomposing and/or removing hazardous substances using a photocatalytic material. The method of the present invention is sufficiently useful in fields requiring quick decomposition and/or removal of hazardous substances in gas and/or liquid phases. The decomposition method of the present invention using a photocatalytic material enables significantly efficient and rapid decomposition of hazardous substances in gas and/or liquid phases by causing a photocatalytic material to coexist with a dilute hydrogen peroxide solution.</p> |
申请公布号 |
EP2578301(A1) |
申请公布日期 |
2013.04.10 |
申请号 |
EP20110789741 |
申请日期 |
2011.05.30 |
申请人 |
SHOWA CO., LTD. |
发明人 |
TAKAYASU, TERUKI;ARAI, TERUO;ONODA, KINJI |
分类号 |
B01D53/86;B01D53/56;B01D53/78;B01J35/02;B01J37/12;B01J37/34 |
主分类号 |
B01D53/86 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|