| 摘要 |
PURPOSE: An apparatus for aligning a substrate is provided to easily correct the alignment error of an alignment roller by controlling a bellows and a cylinder. CONSTITUTION: A stage(250) is installed within a vacuum chamber(100) for a thin film deposition apparatus. The substrate is settled in the stage. A substrate alignment device base(101) is installed at the wall(1) of the vacuum chamber. A bellows through hole and a window are formed in the substrate alignment device base. A bellows(117) and an alignment roller(113) move through the bellows through hole. The bellows and the alignment roller arrange a substrate. |
