发明名称 |
Inspection apparatus, lithographic apparatus, and device manufacturing method |
摘要 |
An inspection apparatus includes an illumination system configured to receive a first beam and to produce second and third beams from the first beam, and a catadioptric objective configured to direct the second beam to reflect from a wafer. The inspection apparatus includes a first sensor configured to detect a first image created by the reflected second beam. The inspection apparatus also includes a refractive objective configured to direct the third beam to reflect from the wafer, and a second sensor configured to detect a second image created by the reflected third beam. In one embodiment, the first and second images can be used for CD measurements. In one embodiment, the second beam has a spectral range from about 200 nm to about 425 nm, and the third beam has a spectral range from about 425 nm to about 850 nm. The inspection apparatus can also include a third sensor configured to detect a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements. |
申请公布号 |
EP2579100(A2) |
申请公布日期 |
2013.04.10 |
申请号 |
EP20120182890 |
申请日期 |
2012.09.04 |
申请人 |
ASML HOLDING N.V. |
发明人 |
SMIRNOV, STANISLAV;RYZHIKOV, LEV;CATEY, ERIC;JOOBEUR, ADEL;HEALD, DAVID;SHMAREV, YEVGENIY;JACOBS, RICHARD |
分类号 |
G03F7/20;G01B11/02 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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