| 摘要 |
PURPOSE: An apparatus for processing a substrate with discharging plasma is provided to increase efficiency of a plasma process by increasing the activity of plasma. CONSTITUTION: A plasma chamber(2) provides a spaced for plasma processing. A microwave supply unit(4) is installed in one side of the plasma chamber. The microwave supply unit causes microwave discharge by providing microwaves to the plasma chamber. A dielectric window(6) is formed between the plasma chamber and the microwave supply unit. The dielectric window provides the microwaves to the plasma chamber by transmitting the microwaves to the microwave supply unit. The microwave supply unit transmits the microwaves through an antenna(8). A distributed antenna device(10) is formed to be contiguous to the dielectric window at the bottom of the antenna. An insulating fluid(12) is filled inside the microwave supply unit. |
