发明名称 |
LITHOGRAPHIC APPARATUS AND METHOD OF COOLING A COMPONENT IN A LITHOGRAPHIC APPARATUS. |
摘要 |
A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component. |
申请公布号 |
NL2009378(A) |
申请公布日期 |
2013.04.09 |
申请号 |
NL20122009378 |
申请日期 |
2012.08.29 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BOXTEL FRANK;NET ANTONIUS;HEUVEL LEONARDA |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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