发明名称 |
Ring-shaped component for use in a plasma processing, plasma processing apparatus and outer ring-shaped member |
摘要 |
A ring-shaped component for use in a plasma processing includes an inner ring-shaped member provided to surround an outer periphery of a substrate to be subjected to the plasma processing and an outer ring-shaped member provided to surround an outer periphery of the inner ring-shaped member. The outer ring-shaped member has a first surface facing a processing space side and a second surface facing an opposite side of the plasma generation side. The second surface has thereon one or more ring-shaped grooves. |
申请公布号 |
US8414735(B2) |
申请公布日期 |
2013.04.09 |
申请号 |
US201113233968 |
申请日期 |
2011.09.15 |
申请人 |
MURAKAMI TAKAHIRO;SATO NOBUHIRO;TOKYO ELECTRON LIMITED |
发明人 |
MURAKAMI TAKAHIRO;SATO NOBUHIRO |
分类号 |
C23F1/00;C23C16/00;H01L21/306 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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