发明名称 Lithographic apparatus and method
摘要 A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
申请公布号 US8416395(B2) 申请公布日期 2013.04.09
申请号 US12436635 申请日期 2009.05.06
申请人 发明人
分类号 G03B0027/000052;G03B0027/000058 主分类号 G03B0027/000052
代理机构 代理人
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