CHEMICAL VAPER DEPOSITION METHOD

摘要

PURPOSE: A chemical vapor deposition method is provided to improve productivity by performing a deposition process in a process pressure condition to maintain a deposition speed over a reference deposition speed. CONSTITUTION: A deposition speed is measured in different process pressure. A deposition speed is measured according to the process pressure(ST10). The maximum deposition speed is drawn from the deposition speed according to the process pressure(ST20). A process pressure range with the deposition speed over a reference deposition speed set based on the maximum deposition speed is drawn(ST30). A deposition process is performed in the process pressure range(ST40). [Reference numerals] (ST10) Step of measuring a deposition speed according to the process pressure; (ST20) Step of drawing the maximum deposition speed; (ST30) Step of drawing a process pressure range; (ST40) Step of performing a deposition process;