| 摘要 |
The invention provides field-enhanced inductive coupling plasma processing apparatus and a plasma forming method. The processing apparatus comprises a process chamber having a dielectric cover, and a plasma source assembly arranged on the dielectric cover. The plasma source assembly comprises at least one horizontal induction coil which performs RF energy induction combination on the process chamber to form and maintain plasma in the process chamber; at least one electricity applying electrode which is electrically connected to the abovementioned horizontal induction coil and performs RF energy capacity combination on the process chamber; a first position adjustment mechanism which is combined to the electricity applying electrode and changes the horizontal position of the abovementioned applying electrode; and an RF generator which is combined to the abovementioned at least one electricity applying electrode. |
