| 摘要 |
<p>PURPOSE: A method for forming a pattern is provided to form the pattern with high quality by preventing a substrate from being affected by a low dielectric material. CONSTITUTION: A resist bottom layer is formed on the upper side of a processed substrate. A resist pattern is formed on the upper side of the resist bottom layer. A pattern is formed on the processed substrate. The resist bottom layer is removed by basic solutions. The resist bottom layer is heated or processed with acid.</p> |
