发明名称 HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要 PURPOSE: A transistor with high electron mobility and a manufacturing method thereof are provided to simplify manufacturing processes by including an HEMT(High Electron Mobility transistor) laminate. CONSTITUTION: An HEMT laminate(60) is separated from a substrate(30). A PIL(Pseudo Insulation Layer)(20) is located between the substrate and the HEMT laminate. The PIL includes at least two kinds of materials. Two materials include a solid material and a non-solid material. The solid material is a semiconductor material. The non-solid material is air.
申请公布号 KR20130035024(A) 申请公布日期 2013.04.08
申请号 KR20110099234 申请日期 2011.09.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JUN YOUN;LEE, JAE WON;CHOI, HYO JI
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
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