METHOD FOR MAKING MEMS DEVICES

摘要

PURPOSE: An MEMS device manufacturing method is provided to obtain excellent performance and shape by easily controlling the thickness of a film according to a device and obtain an MEMS device capable of utilizing an existing semiconductor process. CONSTITUTION: An MEMS device manufacturing method comprises; a step for forming a lower structure(12), a step for a chalcogenide carbon layer; a step for forming insulation-supporting layer on the chalcogenide carbon layer; a step for forming via-holes exposing the lower structure by forming an etched protection layer on the insulation-supporting layer and etching the insulation-supporting layer and the chalcogenide carbon layer; a step for forming an upper structure including a sensor(23) on an insulation-supporting layer; a step for forming one or more through-holes penetrating the insulation-supporting layer; a step for removing the chalcogenide carbon layer through the through-holes in order to arrange the upper and lower structure to be spaced.