METHOD OF APPLYING A PATTERN TO A SUBSTRATE, DEVICE MANUFACTURING METHOD AND LITHOGRAPHIC APPARATUS FOR USE IN SUCH METHODS

摘要

PURPOSE: A method for applying a pattern to a substrate, a method for manufacturing a device, and a lithography apparatus used for the same are provided to improve the accuracy of a patterning position by correcting high order distortions of a nominal alignment grid based on the measured positions of alignment marks. CONSTITUTION: A lighting system(IL) conditions radiation beams(B) and includes various optical elements to form or control the radiation beams. A support structure(MT) supports a patterning device(MA). A substrate table(WTa,WTb) maintains a substrate(W). The substrate table is connected to a second position setting unit(PW) to accurately position the substrate according to preset parameters. A projection system(PS) projects a pattern of the radiation beam on a target of the substrate.