发明名称 |
ELECTRIC-FIELD ASSISTED DEPOSITION OF DNA ON POLYMER SURFACES |
摘要 |
<p>PURPOSE: A DNA deposition method using an electric field is provided to increase the yield of DNA deposition by applying the electric field to DNA solution when DNA is deposited on polymer surface. CONSTITUTION: A DNA deposition method using an electric field is as follows: a step for forming a PMMA film on a silicon wafer(S110); a step for preparing DNA solution including DNA(S120); and a step for depositing the DNA on the PMMA film by applying the electric field to the DNA solution in a state where the silicon wafer is dipped in the DNA solution(S140). [Reference numerals] (AA) Start; (BB) End; (S110) Preparing a polymer surface; (S120) Preparing DNA solution; (S130) Preparing an electric field; (S140) Depositing DNA;</p> |
申请公布号 |
KR20130034326(A) |
申请公布日期 |
2013.04.05 |
申请号 |
KR20110098279 |
申请日期 |
2011.09.28 |
申请人 |
RYU, JUN HWAN |
发明人 |
RYU, JUN HWAN;JONATHON SOKOLOV |
分类号 |
C25D9/02;C08J7/06;C12N13/00;C12Q1/68 |
主分类号 |
C25D9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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