REFLECTION APPARATUS AND BEAM PROJECTOR HAVING THE SAME

摘要

A reflection apparatus for a beam projector, and a beam projector including the reflection apparatus are provided. The reflection apparatus reflects and projects incident light from a projection optical system of the beam projector to an external surface, and includes a first mirror for reflecting the incident light from the projection optical system, and a second mirror that receives the light reflected from the first mirror and reflects the received light to the external surface.