发明名称 APPARATUS AND METHOD FOR TREATING SUBSTRATE
摘要 Provided are an apparatus and method for treating a substrate through a supercritical process. The apparatus includes a housing providing a space for performing a process, and a plurality of support members vertically arranged in the housing at predetermined intervals to support edges of substrates, respectively.
申请公布号 US2013081658(A1) 申请公布日期 2013.04.04
申请号 US201213609986 申请日期 2012.09.11
申请人 SONG GIL HUN;BAE JEONG YONG;KOO KYO WOOG;SEMES CO., LTD. 发明人 SONG GIL HUN;BAE JEONG YONG;KOO KYO WOOG
分类号 B08B3/00 主分类号 B08B3/00
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