NANOIMPRINTING MOLD, METHOD FOR PRODUCING THE NANOIMPRINTING MOLD, NANOIMPRINTING METHOD USING THE NANOIMPRINTING MOLD, AND METHOD FOR PRODUCING PATTERNED SUBSTRATES

摘要

The region in which resist flows during nanoimprinting is restricted without employing a mesa type substrate. A nanoimprinting mold includes: a mold main body (12) having a fine pattern (13) of protrusions and recesses on a surface thereof; and a mold release layer (14) formed on the surface of the mold main body (12). The mold release layer (14) is formed within a mold release layer forming region (R2), which is a region of the mold main body (12) that includes a patterned region (R1) where the pattern (13) of protrusions and recesses is formed and has an outer edge (E2) positioned outside the outer edge (E1) of the patterned region (R1). An outer peripheral mold release layer (14a) has a thickness distribution in which the thickness of the outer peripheral mold release layer (14a) is locally maximal at positions outside the outer edge (E1) of the patterned region (R1), substantially continuously along the entire periphery.