发明名称 |
NANOIMPRINTING APPARATUS, NANOIMPRINTING METHOD, DISTORTION IMPARTING DEVICE AND DISTORTION IMPARTING METHOD |
摘要 |
<p>In nanoimprinting, contact between a pattern of protrusions and recesses of a mold and resist being initiated at the center thereof is enabled utilizing any imprinting member regardless of the rigidity of the imprinting member. A nanoimprinting apparatus (10) is equipped with: a distortion imparting device (20) that applies external force onto an imprinting member (1) to maintain the imprinting member (1) in a predetermined flexed state, thereby imparting permanent distortion to the imprinting member (1); and an imprinting unit (40) that utilizes the imprinting member (1) having the permanent distortion imparted thereto and presses a pattern (2) of protrusions and recesses of a mold (1) onto resist (7) provided on a substrate (6), to transfer the pattern (2) of protrusions and recesses to the resist (7).</p> |
申请公布号 |
WO2013047259(A1) |
申请公布日期 |
2013.04.04 |
申请号 |
WO2012JP73767 |
申请日期 |
2012.09.11 |
申请人 |
FUJIFILM CORPORATION;WAKAMATSU, SATOSHI;HATTORI, AKIKO |
发明人 |
WAKAMATSU, SATOSHI;HATTORI, AKIKO |
分类号 |
H01L21/027;B29C59/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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