发明名称 NANOIMPRINTING APPARATUS, NANOIMPRINTING METHOD, DISTORTION IMPARTING DEVICE AND DISTORTION IMPARTING METHOD
摘要 <p>In nanoimprinting, contact between a pattern of protrusions and recesses of a mold and resist being initiated at the center thereof is enabled utilizing any imprinting member regardless of the rigidity of the imprinting member. A nanoimprinting apparatus (10) is equipped with: a distortion imparting device (20) that applies external force onto an imprinting member (1) to maintain the imprinting member (1) in a predetermined flexed state, thereby imparting permanent distortion to the imprinting member (1); and an imprinting unit (40) that utilizes the imprinting member (1) having the permanent distortion imparted thereto and presses a pattern (2) of protrusions and recesses of a mold (1) onto resist (7) provided on a substrate (6), to transfer the pattern (2) of protrusions and recesses to the resist (7).</p>
申请公布号 WO2013047259(A1) 申请公布日期 2013.04.04
申请号 WO2012JP73767 申请日期 2012.09.11
申请人 FUJIFILM CORPORATION;WAKAMATSU, SATOSHI;HATTORI, AKIKO 发明人 WAKAMATSU, SATOSHI;HATTORI, AKIKO
分类号 H01L21/027;B29C59/02 主分类号 H01L21/027
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