| 发明名称 |
POLISHING COMPOSITION |
| 摘要 |
<p>This polishing composition is used for the purpose of polishing an object of polishing that has a phase change alloy. This polishing composition is characterized by containing an ionic additive. Examples of the ionic additive include a cationic surfactant, an anionic surfactant, an amphoteric surfactant and a cationic water-soluble polymer.</p> |
| 申请公布号 |
WO2013047733(A1) |
申请公布日期 |
2013.04.04 |
| 申请号 |
WO2012JP75051 |
申请日期 |
2012.09.28 |
| 申请人 |
FUJIMI INCORPORATED;IZAWA, YOSHIHIRO;YOSHIZAKI, YUKINOBU |
发明人 |
IZAWA, YOSHIHIRO;YOSHIZAKI, YUKINOBU |
| 分类号 |
H01L21/304;B24B37/00;C09K3/14;H01L27/105;H01L45/00 |
主分类号 |
H01L21/304 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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