METHOD OF FORMING RESIST PATTERN

摘要

PURPOSE: A method for forming a resist pattern is provided to form a negative type pattern for high resolution. CONSTITUTION: A resist composite is coated on a supporter(1) to form a resist film(2). The resist film is exposed by using a photomask(3) having a pattern. A post exposure bake is performed to make a difference of the dissolution velocity in developing solution between an exposure part(2a) and a non-exposure part(2b). The resist film is developed by using the alkaline developing solution to form a negative type resist pattern.