发明名称 |
POLISHING PAD AND GLASS SUBSTRATE MANUFACTURING METHOD USING SAID POLISHING PAD |
摘要 |
<p>A polishing pad used in a glass substrate mirror-polishing process, characterized in that: the polishing pad has multiple open holes on the main surface that contacts the glass substrate; one open hole and another open hole adjacent thereto are separated by a partition; and of the side surfaces of said partition, an inclined section is provided on the side surface on the side of the other open hole and the inclined section has a minimum radius of curvature 20 - 100 µm. Said polishing pad provides, for example, a polishing pad with which polishing liquid components do not accumulate easily in the open holes while the mirror-finish processing rate is maintained.</p> |
申请公布号 |
WO2013046576(A1) |
申请公布日期 |
2013.04.04 |
申请号 |
WO2012JP05802 |
申请日期 |
2012.09.12 |
申请人 |
KONICA MINOLTA ADVANCED LAYERS, INC.;KOMATSU, TAKAFUMI |
发明人 |
KOMATSU, TAKAFUMI |
分类号 |
B24B37/26;B24B1/00;B24B7/24;B24B37/00 |
主分类号 |
B24B37/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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