DIARYLAMINE NOVOLAC RESIN

摘要

[Problem] To provide a novel diarylamine novolac resin, such as phenyl naphthylamine novola resin, and to provide a composition for forming a resist underlayer film for use in a lithography process for a semiconductor device using the above resin. [Solution] A polymer including a structural unit (A) represented by formula (1) (in formula (1), Ar1 and Ar2 represent a benzene ring and a naphthalene ring respectively). A manufacturing method for a semiconductor device, the method including: a step for forming an underlayer film on a semiconductor substrate by means of a composition for forming a resist underlayer film; a step for forming a hard mask on the film; a step for forming a resist film on the hard mask; a step for forming a resist pattern by means of irradiation and development via light or electron beams; a step for etching the hard mask by means of the resist pattern; a step for etching the underlayer film by means of the patterned hard mask; and a step for finishing the semiconductor substrate by means of the patterned underlayer film.