发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p>PURPOSE: A semiconductor device and a method for manufacturing the same are provided to secure a normally-off operation without increasing on-resistance. CONSTITUTION: A semiconductor layer(13) is formed on a substrate(11). A second semiconductor layer(14) is formed on the semiconductor layer. A third semiconductor layer(15) is formed on the second semiconductor layer. A gate electrode(21) is formed on the third semiconductor layer. A source electrode(22) and a drain electrode(23) touch the second semiconductor layer. The third semiconductor layer has a protruding region. [Reference numerals] (AA) Explanation drawing of a semiconductor device in a first embodiment; (BB) Electric intensity;</p>
申请公布号 KR20130033962(A) 申请公布日期 2013.04.04
申请号 KR20120103750 申请日期 2012.09.19
申请人 FUJITSU LIMITED 发明人 KOTANI JUNJI
分类号 H01L29/778;H01L21/336 主分类号 H01L29/778
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