发明名称 |
SUBSTRATE AND SUPERSTRATE DESIGN AND PROCESS FOR NANO-IMPRINTING LITHOGRAPHY OF LIGHT AND CARRIER COLLECTION MANAGEMENT DEVICES |
摘要 |
<p>A process for forming a nano-element structure is provided that includes contacting a template with a material to form the nano-element structure having an array of nano-elements and a base physically connecting the array of nano-elements. The material that is contacted with the template is the nano-element structure material or precursor material from which the array of nano-elements is formed. The nano-element structure is then removed from contact with the template. The nano-element structure material or its precursor is brought into contact with the template for the forming of the array of nano-elements by techniques such as nano -imprinting and printing. A final substrate subsequently supports the array of nano-elements so produced. The array of nano-elements is exposed free and at least one layer of a dopant layer, a spacer layer, a light absorber layer, a conductor, or a counter electrode layer, are employed to complete an operative device.</p> |
申请公布号 |
WO2013048577(A1) |
申请公布日期 |
2013.04.04 |
申请号 |
WO2012US36732 |
申请日期 |
2012.05.07 |
申请人 |
SOLARITY, INC.;FONASH, STEPHEN, J.;NAM, WOOK, JUN |
发明人 |
FONASH, STEPHEN, J.;NAM, WOOK, JUN |
分类号 |
B82B3/00;B29C59/04;H01L31/042;H01L31/10 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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