发明名称 SUBSTRATE AND SUPERSTRATE DESIGN AND PROCESS FOR NANO-IMPRINTING LITHOGRAPHY OF LIGHT AND CARRIER COLLECTION MANAGEMENT DEVICES
摘要 <p>A process for forming a nano-element structure is provided that includes contacting a template with a material to form the nano-element structure having an array of nano-elements and a base physically connecting the array of nano-elements. The material that is contacted with the template is the nano-element structure material or precursor material from which the array of nano-elements is formed. The nano-element structure is then removed from contact with the template. The nano-element structure material or its precursor is brought into contact with the template for the forming of the array of nano-elements by techniques such as nano -imprinting and printing. A final substrate subsequently supports the array of nano-elements so produced. The array of nano-elements is exposed free and at least one layer of a dopant layer, a spacer layer, a light absorber layer, a conductor, or a counter electrode layer, are employed to complete an operative device.</p>
申请公布号 WO2013048577(A1) 申请公布日期 2013.04.04
申请号 WO2012US36732 申请日期 2012.05.07
申请人 SOLARITY, INC.;FONASH, STEPHEN, J.;NAM, WOOK, JUN 发明人 FONASH, STEPHEN, J.;NAM, WOOK, JUN
分类号 B82B3/00;B29C59/04;H01L31/042;H01L31/10 主分类号 B82B3/00
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