| 摘要 |
A sintered sputtering target, the composition of which, in terms of atomic ratio, is represented by the formula (Fe100-X-PtX)100-ACA, with A and X satisfying the relations 20 <= A <= 50 and 35 <= X <= 55. Said sputtering target is characterized by carbon particles finely dispersed in a base alloy and an oxygen content of 300 wt ppm or less. The present invention addresses the problem of providing an iron/platinum sputtering target that allows the production of a highly corrosion-resistant magnetic thin film having a granular structure, has finely dispersed carbon particles that make it easy to create ordered L10 structures, and has a low oxygen content. |
