发明名称 FILM FORMATION METHOD AND FILM FORMATION APPARATUS
摘要 <p>Provided is a film formation apparatus with which an anti-fouling film having high usability and anti-wear performance may be formed efficiently. According to a film formation apparatus (1) of the present invention, a substrate holder (12) which comprises a basal body holding surface for holding a plurality of substrates (14) is disposed in a vacuum container (10) in a rotatable manner. The film formation apparatus (1) comprises an evaporation source (34) which is disposed in the vacuum container (10) in such a manner that a larger amount of film formation material may be supplied to a first area (A3) that is part of the basal body holding surface than to an area other than the first area (remaining area) when operated toward the substrate holder (12) in a rotation stop state; and an ion source (38) which is disposed in the vacuum container (10) in such a manner, arrangement, and / or direction that energetic particle irradiation may be made toward only a second area (A2) that is part of the basal body holding surface when operated toward the substrate holder (12) in the rotation stop state.</p>
申请公布号 WO2013047605(A1) 申请公布日期 2013.04.04
申请号 WO2012JP74755 申请日期 2012.09.26
申请人 SHINCRON CO., LTD. 发明人 SHIONO, ICHIRO;HAYASHI, TATSUYA;JIANG, YOUSONG;NAGAE, EKISHU;MIYAUCHI, MITSUHIRO;SAMORI, SHINGO
分类号 C23C14/02;C23C14/22 主分类号 C23C14/02
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