WIRING LAYOUT DESIGN METHOD, SEMICONDUCTOR DEVICE, AND PROGRAM THAT SUPPORTS WIRING LAYOUT DESIGN

摘要

PROBLEM TO BE SOLVED: To provide a wiring layout design method capable of achieving high integration, a semiconductor device, and a program that supports the design of a wiring layout.

SOLUTION: A wiring layout design method according to an embodiment, which is a method of designing a layout formed by a side-wall method, includes the steps of: preparing a base pattern in which a plurality of first patterns that extend in a first direction and are arranged at a first interval in a second direction crossing in the first direction and a plurality of second patterns that extend in the first direction and arranged at each center between the first patterns; and connecting two of the adjacent first patterns sandwiching one of the second patterns with a pattern extending in the second direction and replacing the one of the second patterns with two patterns that do not contact the two of the first patterns.

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