METHOD OF GENERATING STANDARD CELL LIBRARY FOR DPL PROCESS AND METHODS OF PRODUCING A DPL MASK AND CIRCUIT PATTERN USING THE SAME

摘要

A method of constructing a standard cell library for double patterning lithography (DPL) includes dividing a standard cell into a first region determined not to have an interaction with an adjacent outer cell and a second region that is likely to have such an interaction, generating data representative of DPL patterns corresponding to the first and second regions, and generating a standard cell library made up of the data. The library is then accessed and used to form a DPL mask. The DPL mask can be used to form a pattern on a substrate made up of a layout of cells in which the pattern of the standard cell is duplicated at several locations in the layout.