APPARATUS FOR PLASMA PROCESSING

摘要

PURPOSE: A plasma process apparatus is provided to reduce the inner space of a gas supply line by using an insertion member and to prevent an arcing phenomenon. CONSTITUTION: A chamber(110) includes a first electrode(140) and a second electrode(150). The chamber has an internal space for plasma reaction. An external power supply device(170) supplies power to the first electrode. A gas supply pipe(120) supplies reaction gas to the chamber. An insertion member is inserted into the gas supply pipe and includes an insulating material.