| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern having excellent pattern collapse margin (PCM) can be produced. <P>SOLUTION: The resist composition comprises: a resin that is insoluble or substantially insoluble with an alkali aqueous solution and can be dissolved in an alkali aqueous solution by an action of an acid; an acid generator; and a compound expressed by formula (I). In formula (I), R<SP POS="POST">1a</SP>and R<SP POS="POST">1b</SP>are the same or different from each other, representing a 1-18C hydrocarbon group, in which a methylene group included in the hydrocarbon may be substituted with an oxygen atom or a carbonyl group, or R<SP POS="POST">1a</SP>and R<SP POS="POST">1b</SP>are boned to form a ring optionally having a substituent; and R<SP POS="POST">2</SP>and R<SP POS="POST">3</SP>are the same or different from each other, representing a 1-18C hydrocarbon group optionally having a substituent, or R<SP POS="POST">2</SP>and R<SP POS="POST">3</SP>may be bonded to form a ring optionally having a substituent. <P>COPYRIGHT: (C)2013,JPO&INPIT |
