发明名称 POLISHING COMPOSITION
摘要 <p>This polishing composition is used for the purpose of polishing a polishing object that contains a phase change alloy, and is characterized by containing ammonium ions (NH4 +). This polishing composition may additionally contain abrasive grains such as colloidal silica grains.</p>
申请公布号 WO2013047734(A1) 申请公布日期 2013.04.04
申请号 WO2012JP75052 申请日期 2012.09.28
申请人 FUJIMI INCORPORATED;YOSHIZAKI, YUKINOBU;IZAWA, YOSHIHIRO 发明人 YOSHIZAKI, YUKINOBU;IZAWA, YOSHIHIRO
分类号 H01L21/304;B24B37/00;C09K3/14;H01L27/105;H01L45/00 主分类号 H01L21/304
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