发明名称 SUBSTRATE PROCESSING SYSTEM, AND INDICATION METHOD FOR SUBSTRATE PROCESSING SYSTEM
摘要 <p>According to the present invention, a load is reduced which is related to an operation for holding auxiliary equipment connected to a substrate processing device, and maintaining the auxiliary equipment. The present invention comprises the substrate processing device; the auxiliary equipment which is related to the substrate processing device, and connected directly or indirectly to the substrate processing device; a storage device which accommodates at least information related to the auxiliary equipment collected by the auxiliary equipment; and a display device which displays a connection relation between the substrate processing device and the auxiliary equipment based on the information accommodated in the storage device. The auxiliary equipment is an exhaust system which discharges gas and heat and a cylinder cabinet where a gas cylinder is located, and the display device displays a connection relation between the substrate processing device and the cylinder cabinet, and a connection relation between the substrate processing device and the exhaust system in connection with each other.</p>
申请公布号 WO2013047127(A1) 申请公布日期 2013.04.04
申请号 WO2012JP72588 申请日期 2012.09.05
申请人 HITACHI KOKUSAI ELECTRIC INC.;NAKANO, MINORU;SAITO, TSUYOSHI 发明人 NAKANO, MINORU;SAITO, TSUYOSHI
分类号 H01L21/02;G05B19/418 主分类号 H01L21/02
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