CURABLE COMPOSITION FOR IMPRINT, PATTERN FORMING METHOD, AND PATTERN

摘要

Provided is a curable composition for imprint, a cured film of which has improved surface roughness. A curable composition for imprint, which contains (A) a polymerizable compound, (B) a polymerization initiator and (C) a non-polymerizable compound. The curable composition for imprint contains, as the non-polymerizable compound (C): (C1) at least one kind of surfactant that contains 20% by mass of more of fluorine atoms; and (C2) at least one kind of polymer that contains 3% by mass or more but less than 20% by mass of fluorine atoms and/or 5% by mass or more but less than 40% by mass of silicon atoms and that has a weight average molecular weight (Mw) of 1,000-100,000.