发明名称 |
METHOD OF MAKING MASK, PATTERNING METHOD USING THE MASK, AND METHOD OF MANUFACTURING MICRO DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of making a mask for stably patterning a thin film. <P>SOLUTION: The present invention relates to the method of making a mask for patterning a thin film. The method includes a step S1 of depositing an inorganic material soluble in an alkaline solution on a substrate, a step S2 of forming the inorganic material into a predetermined pattern, and a step S3 of forming a mask by narrowing the inorganic material by the alkaline solution. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013062481(A) |
申请公布日期 |
2013.04.04 |
申请号 |
JP20120094576 |
申请日期 |
2012.04.18 |
申请人 |
TDK CORP |
发明人 |
WATANABE HISAYOSHI;TANITSU HIDEYUKI;NISHIZAWA TAKAYUKI;SANO MASASHI;UMEHARA HIROMICHI;KANETANI TAKAYASU;HORI TETSUJI |
分类号 |
H01L21/027;G11B5/31;G11B5/39 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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