发明名称 METHOD OF MAKING MASK, PATTERNING METHOD USING THE MASK, AND METHOD OF MANUFACTURING MICRO DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of making a mask for stably patterning a thin film. <P>SOLUTION: The present invention relates to the method of making a mask for patterning a thin film. The method includes a step S1 of depositing an inorganic material soluble in an alkaline solution on a substrate, a step S2 of forming the inorganic material into a predetermined pattern, and a step S3 of forming a mask by narrowing the inorganic material by the alkaline solution. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013062481(A) 申请公布日期 2013.04.04
申请号 JP20120094576 申请日期 2012.04.18
申请人 TDK CORP 发明人 WATANABE HISAYOSHI;TANITSU HIDEYUKI;NISHIZAWA TAKAYUKI;SANO MASASHI;UMEHARA HIROMICHI;KANETANI TAKAYASU;HORI TETSUJI
分类号 H01L21/027;G11B5/31;G11B5/39 主分类号 H01L21/027
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