发明名称 COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM AND METHOD FOR FORMING RESIST PATTERN
摘要 A composition for forming a liquid immersion upper layer film, includes a first polymer, a second polymer and a solvent. The first polymer includes a first structural unit having a group represented by a following formula (i). In the formula (i), n is an integer of 1 to 3, and R1 represents a hydrocarbon group having a valency of (n+1) and having 1 to 20 carbon atoms. The second polymer is different from the first polymer.—R1OH)n  (i)
申请公布号 US2013084524(A1) 申请公布日期 2013.04.04
申请号 US201213630263 申请日期 2012.09.28
申请人 JSR CORPORATION;JSR CORPORATION 发明人 HAYAMA TAKAHIRO;KUSABIRAKI KAZUNORI;TANAKA KIYOSHI;SHIMA MOTOYUKI
分类号 G03F7/004;G03F7/20 主分类号 G03F7/004
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