发明名称 Compound semiconductor device and method of manufacturing the same
摘要 A HEMT has a compound semiconductor layer, a protection film which has an opening and covers an upper side of the compound semiconductor layer, and a gate electrode which fills the opening and has a shape riding on the compound semiconductor layer, wherein the protection film has a stacked structure of a lower insulating film not containing oxygen and an upper insulating film containing oxygen, and the opening includes a first opening formed in the lower insulating film and a second opening formed in the upper insulating film and wider than the first opening, the first opening and the second opening communicating with each other.
申请公布号 EP2575180(A2) 申请公布日期 2013.04.03
申请号 EP20120179147 申请日期 2012.08.03
申请人 FUJITSU LIMITED 发明人 OHKI, TOSHIHIRO;OKAMOTO, NAOYA;MINOURA, YUICHI;MAKIYAMA, KOZO;OZAKI, SHIROU
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
代理机构 代理人
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