发明名称 APPARATUS FOR DRYING SUBSTRATE
摘要 PURPOSE: An apparatus for drying a substrate is provided to remove chemicals from a substrate by using the rotation force of airstream. CONSTITUTION: When a substrate(S) is transferred by a transfer shaft(12), a rotation cylinder(100) rotates in the opposite direction to the substrate. Therefore, airstream is generated between the substrate and the rotation cylinder. The airstream removes chemicals(C) remaining on the substrate.
申请公布号 KR101249887(B1) 申请公布日期 2013.04.03
申请号 KR20110128407 申请日期 2011.12.02
申请人 K.C.TECH CO., LTD. 发明人 CHAE, HEE SUNG
分类号 G02F1/13;B65G49/06;H01L21/302 主分类号 G02F1/13
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