发明名称 Method of producing semiconductor porcelain composition
摘要 <p>[PROBLEMS] To provide a method for producing a semiconductor porcelain composition which can shift the Currie temperature to the positive direction without the use of Pb and can produce a semiconductor porcelain composition being markedly reduced in the resistivity at room temperature, and a method for producing a semiconductor porcelain composition which can impart uniform characteristics also to the interior of a material with no complicated heat treatment even if the material has a shape of a relatively great thickness. [MEANS FOR SOLVING PROBLEMS] A method for producing a semiconductor porcelain composition which has an empirical formula represented by [(Bi 0.5 Na 0.5 ) x (Ba 1-y R y ) 1-x ]TiO 3 (where R is at least one of La, Dy, Eu, Gd and Y), where x and y satisfy 0 &lt; x ‰¦ 0.14 and 0.002 &lt; y ‰¦ 0.02, and wherein the sintering of the composition is carried out in an inert gas atmosphere having an oxygen concentration of 1% or less, and thereby, the resistivity at room temperature can be remarkably reduced and uniform characteristics can be imparted also to the interior of the resultant material.</p>
申请公布号 EP2502893(A3) 申请公布日期 2013.04.03
申请号 EP20120173237 申请日期 2006.03.31
申请人 HITACHI METALS, LTD. 发明人 SHIMADA, TAKESHI;TERAO, KOICHI;TOJI, KAZUYA
分类号 C04B35/468;C04B35/626;H01C7/02;H01G4/12 主分类号 C04B35/468
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